Experimental design approach for deposition optimization of RF sputtered chalcogenide thin films devoted to environmental optical sensors
|Author(s)||Baudet Emeline1, Sergent M.2, Nemec P.3, Cardinaud C.4, Rinnert Emmanuel5, Michel K.6, Jouany L.1, Bureau B.1, Nazabal V.1, 3|
|Affiliation(s)||1 : Univ Rennes 1, UMR CNRS 6226, Inst Sci Chim Rennes, F-35042 Rennes, France.
2 : Aix Marseille Univ, LISA EA4672, Campus Sci St Jerome, F-13397 Marseille, France.
3 : Univ Pardubice, Fac Chem Technol, Dept Graph Arts & Photophys, Studentska 573, Pardubice 53210, Czech Republic.
4 : Univ Nantes, CNRS, Inst Mat Jean Rouxel IMN UMR 6502, F-44322 Nantes 3, France.
5 : IFREMER, Lab Detect Capteurs & Mesures, Dept Rech & Dev Technol, F-29280 Plouzane, France.
6 : Bur Rech Geol & Minieres, Direct Eau Environm & Ecotechnol, Unite Biogeochim Environm & Qualite Eau, F-45060 Orleans, France.
|Source||Scientific Reports (2045-2322) (Nature Publishing Group), 2017-06 , Vol. 7 , N. 3500 , P. 1-14|
|WOS© Times Cited||17|
The development of the optical bio-chemical sensing technology is an extremely important scientific and technological issue for diagnosis and monitoring of diseases, control of industrial processes, environmental detection of air and water pollutants. Owing to their distinctive features, chalcogenide amorphous thin films represent a keystone in the manufacture of middle infrared integrated optical devices for a sensitive detection of biological or environmental variations. Since the chalcogenide thin films characteristics, i. e. stoichiometric conformity, structure, roughness or optical properties can be affected by the growth process, the choice and control of the deposition method is crucial. An approach based on the experimental design is undoubtedly a way to be explored allowing fast optimization of chalcogenide film deposition by means of radio frequency sputtering process. Argon (Ar) pressure, working power and deposition time were selected as potentially the most influential factors among all possible. The experimental design analysis confirms the great influence of the Ar pressure on studied responses: chemical composition, refractive index in near-IR (1.55 mu m) and middle infrared (6.3 and 7.7 mu m), band-gap energy, deposition rate and surface roughness. Depending on the intended application and therefore desired thin film characteristics, mappings of the experimental design meaningfully help to select suitable deposition parameters.